Stability of silver thin films on cobalt and nickel silicides

Thin Solid Films

Volumn 434, Issue 1-2, 2003, Pages 258-263

  Mitan, M M ^a   Alford, T L ^a   Mayer, J W ^a  

^a Arizona State University   (United States)

Author keywords

Metallization; Silicides; Thin film

Indexed keywords

AGGLOMERATION; ANNEALING; COBALT COMPOUNDS; INTERFACES (MATERIALS); METALLIZING; NICKEL COMPOUNDS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; THERMAL EFFECTS; THERMODYNAMIC STABILITY; THIN FILMS; X RAY DIFFRACTION;

GRAIN COARSENING;

SILVER;

EID: 0037567595     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00451-6     Document Type: Article

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