Low-temperature deposition of polycrystalline silicon thin films by hot-wire CVD

Solar Energy Materials and Solar Cells

Volumn 48, Issue 1-4, 1997, Pages 269-277

  Rath, J K ^a   Meiling, H ^a   Schropp, R E I ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

Hot wire chemical vapor deposition; Polycrystalline silicon; Solar cell

Indexed keywords

ACTIVATION ENERGY; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; CRYSTAL ORIENTATION; GRAIN SIZE AND SHAPE; PHOTOCONDUCTIVITY; POLYCRYSTALLINE MATERIALS; SPECTROSCOPIC ANALYSIS; THIN FILMS; VOLUME FRACTION;

HOT WIRE CHEMICAL VAPOR DEPOSITION; PHOTOTHERMAL DEFLECTION SPECTROSCOPY (PDS); STEADY STATE PHOTOCARRIER GRATING TECHNIQUE;

SILICON SOLAR CELLS;

EID: 0031276052     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(97)00110-4     Document Type: Article

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