Electrostatically induced submicron patterning of thin perfect and leaky dielectric films: A generalized linear stability analysis

Journal of Chemical Physics

Volumn 118, Issue 8, 2003, Pages 3790-3803

  Pease III, Leonard F ^a   Russel, William B ^a  

^a Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FILMS; ELECTROSTATICS; GLASS TRANSITION; LITHOGRAPHY; MASKS; SILICON WAFERS; SPIN COATING; STABILITY; SURFACE TENSION;

THIN LEAKY DIELECTRIC FILMS;

THIN FILMS;

EID: 0037460577     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1529686     Document Type: Article

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28. See EPAPS Document No. E-JCPSA6-118-709303 for supplemental derivations. A direct link to this document may be found in the online article's HTML reference section. The document may also be reached via the EPAPS homepage (http://www.aip.org/pubservs/epaps.html) or from ftp.aip.org in the directory /epaps/. See the EPAPS homepage for more information.