SCOPUS 정보 검색 플랫폼

Volumn 56, Issue 3-4, 1999, Pages 259-269

Analysis of the influence of the gas pressure during the deposition of electrochromic WO3 films by reactive r.f. sputtering of W and WO3 target

(5) Masetti, E a Grilli, M L a Dautzenberg, G b Macrelli, G c Adamik, M d

a ENEA (Italy)

b SAPIENZA UNIVERSITY OF ROME (Italy)

c Isoclima SpA (Italy)

d RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE (Hungary)

Author keywords

Deposition; Electrochromic WO3 films; Gas pressure; Sputtering

Indexed keywords

CERAMIC MATERIALS; DIFFUSION IN SOLIDS; ELECTROCHROMISM; ELECTROLYTES; LITHIUM; MORPHOLOGY; OPTICAL PROPERTIES; POROSITY; PRESSURE EFFECTS; SPUTTER DEPOSITION; TUNGSTEN; TUNGSTEN COMPOUNDS;

ELECTROCHROMIC DEVICES; TUNGSTEN TRIOXIDE;

ELECTROOPTICAL MATERIALS;

EID: 0032713791 PISSN: 09270248 EISSN: None Source Type: Journal
DOI: 10.1016/S0927-0248(98)00136-6 Document Type: Article

Times cited : (23)

References (15)

1
- 0019049396
- A. Deneuville, P. Gerard, R. Billat, Thin Solid Films 70 (1980) 203.
- (1980) Thin Solid Films , vol.70 , pp. 203
- Deneuville, A.¹ Gerard, P.² Billat, R.³

2
- 0026900011
- Jing-Dong Guo, K.P. Reis, M.S. Whittingham, Solid State Ionics 53-56 (1992) 305.
- (1992) Solid State Ionics , vol.53-56 , pp. 305
- Guo, J.-D.¹ Reis, K.P.² Whittingham, M.S.³

3
- 0003529398
- Elsevier, Amsterdam
- V.G. Granqvist, Handbook of inorganic electrochromic materials, Elsevier, Amsterdam, 1995.
- (1995) Handbook of Inorganic Electrochromic Materials
- Granqvist, V.G.¹

4
- 0027836481
- C.M. Lampert, Thin Solid Films 236 (1993) 6.
- (1993) Thin Solid Films , vol.236 , pp. 6
- Lampert, C.M.¹

5
- 0030104928
- R.A. Batchelor, M.S. Burdis, J.R. Siddle, J. Electrochem. Soc. 143 (3) (1996) 1050.
- (1996) J. Electrochem. Soc. , vol.143 , Issue.3 , pp. 1050
- Batchelor, R.A.¹ Burdis, M.S.² Siddle, J.R.³

6
- 0020826267
- K. Miyake, H. Kaneko, N. Suedomi, S. Nishimoto, J. Appl. Phys. 54 (9) (1983) 5256.
- (1983) J. Appl. Phys. , vol.54 , Issue.9 , pp. 5256
- Miyake, K.¹ Kaneko, H.² Suedomi, N.³ Nishimoto, S.⁴

7
- 0020850163
- N. Yoshiike, S. Kondo, J. Electrochem. Soc. 130 (11) (1983) 2283.
- (1983) J. Electrochem. Soc. , vol.130 , Issue.11 , pp. 2283
- Yoshiike, N.¹ Kondo, S.²

8
- 0027680668
- Ji-Guang Zhang, C.E. Tracy, D.K. Benson, S.K. Deb, J. Mater. Res. 8 (10) (1993) 2649.
- (1993) J. Mater. Res. , vol.8 , Issue.10 , pp. 2649
- Zhang, J.-G.¹ Tracy, C.E.² Benson, D.K.³ Deb, S.K.⁴

9
- 0019612734
- K. Meyer, I.K. Schuller, C.M. Falco, J. Appl. Phys. 52 (9) (1981) 5803.
- (1981) J. Appl. Phys. , vol.52 , Issue.9 , pp. 5803
- Meyer, K.¹ Schuller, I.K.² Falco, C.M.³

10
- 33645739140
- C.G. Granqvist, in: Phys. Thin Films 17 (1993) 335.
- (1993) Phys. Thin Films , vol.17 , pp. 335
- Granqvist, C.G.¹

11
- 0020114149
- H. Kaneko, K. Miyake, Y. Teramoto, J. Appl. Phys. 53 (4) (1982) 3070.
- (1982) J. Appl. Phys. , vol.53 , Issue.4 , pp. 3070
- Kaneko, H.¹ Miyake, K.² Teramoto, Y.³

12
- 0028195907
- M.S. Burdis, J.R. Siddle, Thin Solid Films 237 (1994) 320.
- (1994) Thin Solid Films , vol.237 , pp. 320
- Burdis, M.S.¹ Siddle, J.R.²

13
- 0025474691
- S. Yamada, S. Yoshida, M. Kitao, Solid State Ionics 40/41 (1990) 487.
- (1990) Solid State Ionics , vol.40-41 , pp. 487
- Yamada, S.¹ Yoshida, S.² Kitao, M.³

14
- 0017719586
- J.A. Thornton, Ann. Rev. Mater. Sci. 7 (1977) 239.
- (1977) Ann. Rev. Mater. Sci. , vol.7 , pp. 239
- Thornton, J.A.¹

15
- 0015615177
- S.K. Deb, Philos. Mag. 27 (4) (1973) 801.
- (1973) Philos. Mag. , vol.27 , Issue.4 , pp. 801
- Deb, S.K.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.