Influence of target structure on film stress in WTi sputtering

Materials Research Society Symposium - Proceedings

Volumn 505, Issue , 1998, Pages 427-432

  Lo, Chi Fung ^a   Wang, Hong ^a   Gilman, Paul ^a  

^a Materials Research Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; CRYSTAL MICROSTRUCTURE; FILM PREPARATION; MECHANICAL TESTING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS; SPUTTER DEPOSITION; STRESS CONCENTRATION; THERMAL EFFECTS;

FILM STRESS; SILICON OXIDE WAFERS;

TUNGSTEN COMPOUNDS;

EID: 0031635260     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)