Structure and properties of stacking faulted A15 tungsten thin films

Journal of Materials Science

Volumn 36, Issue 1, 2001, Pages 93-98

  Shen, Y G ^a   Mai, Y W ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL IMPURITIES; ELECTRON DIFFRACTION; ELECTRON ENERGY LOSS SPECTROSCOPY; MAGNETRON SPUTTERING; OXYGEN; SCANNING ELECTRON MICROSCOPY; STACKING FAULTS; THERMODYNAMIC STABILITY; THIN FILMS; TUNGSTEN; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ENERGY FILTERED ELECTRON DIFFRACTION; REDUCED DENSITY FUNCTIONS (RDF);

METALLIC FILMS;

EID: 0035121058     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004847009613     Document Type: Article

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