Selective dewetting for general purpose patterning

Advanced Materials

Volumn 15, Issue 4, 2003, Pages 332-334

  Kim, Youn Sang ^a   Lee, Hong H ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; COPPER; ELECTROLESS PLATING; GLASS TRANSITION; MOLECULAR WEIGHT; PLASTIC FILMS; POLYSTYRENES; SILICONES; SUBSTRATES; TEMPERATURE; THIN FILMS;

DEWETTING; POLYDIMETHYLSILOXANE; POLYMER FILM; POLYMER MELT;

WETTING;

EID: 0037450251     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200390082     Document Type: Article

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