Charge trapping and charge compensation during Auger electron spectroscopy on SiO2

Journal of Applied Physics

Volumn 86, Issue 4, 1999, Pages 2337-2341

  Guo, Hansheng ^a   Maus Friedrichs, W ^b   Kempter, V ^b  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

^b CLAUSTHAL UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000942164     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371051     Document Type: Article

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