Fabrication and analysis of the nanometer-sized structure of silicon by ultrahigh vacuum field emission transmission electron microscope

Applied Surface Science

Volumn 146, Issue 1, 1999, Pages 257-261

  Takeguchi, Masaki ^a   Tanaka, Miyoko ^a   Furuya, Kazuo ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; DESORPTION; ELECTRON BEAMS; ELECTRON IRRADIATION; ELECTRON MICROSCOPES; NANOSTRUCTURED MATERIALS; SILICA; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON STIMULATED DESORPTION; NANOCRYSTALS; NANOPARTICLES;

SILICON;

EID: 0032663323     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00008-2     Document Type: Article

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