Raman spectroscopy of polycrystalline molybdenum suicide thin films

Materials Letters

Volumn 30, Issue 2-3, 1997, Pages 209-215

  Srinivas, G ^a,b   Vankar, V D ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Films; Molybdenum silicide; MoSi2; Raman spectra; Si substrate

Indexed keywords

ANNEALING; FILM PREPARATION; MAGNETRON SPUTTERING; METALLOGRAPHIC MICROSTRUCTURE; MOLYBDENUM COMPOUNDS; POLYCRYSTALLINE MATERIALS; RAMAN SPECTROSCOPY; STRESSES; SUBSTRATES;

MOLYBDENUM DISILICIDE; MOLYBDENUM SILICIDE; OUTDIFFUSION;

THIN FILMS;

EID: 0031078382     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(96)00199-1     Document Type: Article

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