Changes in chemical behavior of thin film lead zirconate titanate during Ar + -ion bombardment using XPS

Applied Surface Science

Volumn 206, Issue 1-4, 2003, Pages 119-128

  Kim, Jae Nam ^a   Shin, Kwang Soo ^a   Kim, Dae Hwan ^b   Park, Byung Ok ^c   Kim, Nam Kyoung ^c   Cho, Sang Hee ^c  

^a Research Institute of Industrial Science and Technology (RIST)   (South Korea)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

^c Kyungpook National University   (South Korea)

Author keywords

Ar + ion bombardment; Lead zirconate titanate (PZT); Relative atomic sensitivity factors (ASF); X ray photoelectron spectroscopy (XPS)

Indexed keywords

ARGON; ION BOMBARDMENT; LEAD COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; POSITIVE IONS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC SENSITIVITY FACTORS (ASF);

THIN FILMS;

EID: 0037441185     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)01229-1     Document Type: Article

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