Substrates effects on the growth behavior of copper tetra-tert-butyl phthalocyanine films studied by atomic force microscopy

Thin Solid Films

Volumn 423, Issue 2, 2003, Pages 169-177

  Lee, Yuh Lang ^a   Wu, Hsin Yung ^a   Chang, Chien Hsiang ^a   Yang, Yu Min ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Atomic force microscopy; Film morphology; Phthalocyanine; Physical vapor deposition; Silanized surface

Indexed keywords

ADHESIVES; ATOMIC FORCE MICROSCOPY; COPPER; HYDROPHILICITY; LANGMUIR BLODGETT FILMS; NUCLEATION; PLASTIC FILMS; X RAY DIFFRACTION ANALYSIS;

PHTHALOCYANINE FILMS;

CONDUCTIVE PLASTICS;

EID: 0037439445     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01051-9     Document Type: Article

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