Nucleation and growth of clusters in the process of vapor deposition

Surface Science

Volumn 429, Issue 1, 1999, Pages 150-160

  Chen, Liang Huei ^a   Chen, Chi Yun ^b   Lee, Yuh Lang ^a  

^a CHIA NAN UNIVERSITY OF PHARMACY AND SCIENCE   (Taiwan)

^b NAN JEON INSTITUTE OF TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (SPECIFIC GRAVITY); FILM GROWTH; NUCLEATION; NUMERICAL METHODS; PARTICLE SIZE ANALYSIS; SURFACE STRUCTURE; SURFACES; THERMAL EFFECTS; VAPOR DEPOSITION;

ADATOM; ADATOM CONCENTRATION; ADATOM DIFFUSION EQUATION; CLUSTER DENSITY; CLUSTER SIZE DISTRIBUTION; CLUSTERS; FILM STRUCTURE; GROWTH RATE; LOW VAPOR IMPINGING; SURFACE COVERAGE RATIO;

THIN FILMS;

EID: 0032635707     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00360-X     Document Type: Article

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