Gas sensitive properties of copperphthalocyanine thin films

Applied Surface Science

Volumn 92, Issue , 1996, Pages 643-646

  Masui, Masayoshi ^a   Sasahara, Masamitsu ^a   Wada, Tatsuaki ^a   Takeuchi, Manabu ^a  

^a IBARAKI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; EVAPORATION; FILM PREPARATION; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING ORGANIC COMPOUNDS; SUBSTRATES; TEMPERATURE; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS;

COPPERPHTHALOCYANINE; GAS SENSITIVE PROPERTIES; GOLD ELECTRODES; NITROGEN DIOXIDE;

THIN FILMS;

EID: 0030562379     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00310-X     Document Type: Article

References (5)

1. J. Simon and J.-J. Andre, in: Molecular Semiconductors, Eds. J.M. Lehn and Ch.W. Rees (Springer, Berlin, 1985) p. 73.
2. A.K. Ghosh, D.L. Morel, T. Feng, R.F. Shaw and C.A. Rowe, Jr., J. Appl. Phys. 45 (1974) 230.
3. S. Dogo, J.-P. Germain, C. Maleysson and A. Pauly, Thin Solid Films 219 (1992) 244.
4. S. Dogo, J.-P. Germain, C. Maleysson and A. Pauly, Thin Solid Films 219 (1992) 251.
5. A.K. Ray, M.J. Cook, S.C. Thorpe and S. Mukhopadhyay, Phys. Status Solidi (a) 140 (1993) K85.