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Volumn 71, Issue 1-2 SPEC., 2003, Pages 329-333
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XPS and He II photoelectron yield study of the activation process in Ti-Zr NEG films
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Author keywords
Activation process; Non evaporable getters; Oxide reduction; Photoelectron yield; Ti Zr alloys; XPS
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Indexed keywords
CHEMICAL BONDS;
GETTERS;
HELIUM;
THIN FILMS;
X RAY PHOTOELECTRON SPECTROSCOPY;
OXIDE REDUCTION;
TITANIUM ALLOYS;
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EID: 0037427462
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0042-207X(02)00760-1 Document Type: Conference Paper |
Times cited : (15)
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References (16)
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