Excimer laser crystallization of amorphous silicon on metal coated glass substrates

Thin Solid Films

Volumn 427, Issue 1-2, 2003, Pages 86-90

  Brendel, K ^a   Nickel, N H ^a   Lengsfeld, P ^a   Schopke A ^a   Sieber, I ^a   Nerding, M ^b   Strunk, H P ^b   Fuhs, W ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Laser crystallization; Metal induced crystallization; Polycrystalline silicon

Indexed keywords

AMORPHOUS SILICON; AUGER ELECTRON SPECTROSCOPY; COATING TECHNIQUES; CRYSTALLIZATION; EXCIMER LASERS; GLASS; GRAIN SIZE AND SHAPE; LASER BEAM EFFECTS; METALS; MIXING; POLYSILICON; RAMAN SPECTROSCOPY; SUBSTRATES;

METAL COATED GLASS;

THIN FILMS;

EID: 0037416579     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01251-8     Document Type: Conference Paper

References (17)

1. Sameshima T., Hara M., Usui S. Jpn. J. Appl. Phys. Part 1. 28:1989;1789.
2. Bergmann R.B., Kohler J., Dassow R., Zaczek C., Werner J.H. Phys. Stat. Sol. (a). 166:1998;587.
3. Brotherton S.D., Mc Culloch D.J., Clegg J.B., Gowers J.P. IEEE Trans. Electron Dev. 40:1993;407.
4. Boyce J.B., Mei P., Fulks R.T., Ho J. Phys. Stat. Sol. (a). 166:1998;729.
5. Im J.S., Kim H.J., Thomson M.O. Appl. Phys. Lett. 63:1993;1969.
6. Lengsfeld P., Nickel N.H., Fuhs W. Appl. Phys. Lett. 76:2000;1680.
7. Borisenko V.E. Borisenko V.E. Semiconducting Silicides, vol. 39. 2001;103 Springer, Berlin.
8. Jin Z., Bhat G.A., Yeung M., Kwok H.S., Wong M. J. Appl. Phys. 84:1998;194.
9. Nast O., Puzzer T., Koschier L.M., Sproul A.B., Wenham S.R. Appl. Phys. Lett. 73:1998;3214.
10. Christiansen S., Lengsfeld P., Krinke J., Nerding M., Nickel N.H., Strunk H.P. J. Appl. Phys. 86:2001;5348.
11. Nickel N.H., Lengsfeld P., Sieber I. Phys. Rev. B. 61:2000;15558.
12. Cerdeira F., Fjeldy T.A., Cardona M. Phys. Rev. B. 8:1973;4734.
13. Fano U. Phys. Rev. 124:1961;1866.
14. Lee P.S., Mangelinck D., Pey K.L., Shen Z.X., Ding J., Osipowicz T., See A. El. Chem. Sol. Stat. Lett. 3:2000;153.
15. Brendel K., Lengsfeld P., Sieber I., Schöpke A., Nickel N.H., Nerding M., Strunk H.P., Fuhs W. J. Appl. Phys. 91:2002;2969.
16. Nast O., Wenham S.R. J. Appl. Phys. 88:2000;124.
17. Lengsfeld P., Nickel N.H., Genzel C., Fuhs W. J. Appl. Phys. 91:2002;9128.