Defect and electronic structure of TiSi2 thin films produced by co-sputterings. Part II: Chemical bonding and electron energy-loss near-edge structures

Acta Materialia

Volumn 49, Issue 12, 2001, Pages 2321-2328

  Mizoguchi, T ^a   Tanaka, I ^a   Mizuno, M ^b   Adachi, H ^a   Hashimoto, T ^a   Inui, H ^a   Yamaguchi, M ^a  

^a KYOTO UNIVERSITY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Ab initio calculation; Electron energy loss spectroscopy (EELS); Phase transformations; Transition metal disilicide; Transmission electron microscopy (TEM)

Indexed keywords

CHEMICAL BONDS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRONIC STRUCTURE; PHASE TRANSITIONS; SPUTTERING; THIN FILMS; TITANIUM ALLOYS; TRANSMISSION ELECTRON MICROSCOPY;

COSPUTTERING; COVALENT BOND DENSITY (CVD); ELECTRON ENERGY LOSS NEAR EDGE STRUCTURES (ELNES) SPECTROSCOPY; TITANIUM DISILICIDE;

AMORPHOUS ALLOYS;

EID: 0035902664     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(01)00138-0     Document Type: Article

References (15)