Effect of nickel thickness and microwave power on the growth of carbon nanotubes by microwave-heated chemical vapor deposition

Microelectronic Engineering

Volumn 66, Issue 1-4, 2003, Pages 10-16

  Huang, J H ^a   Chuang, C C ^a   Tsai, C H ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; ELECTRON GUNS; FILM GROWTH; FLAT PANEL DISPLAYS; MICROWAVES; SCANNING ELECTRON MICROSCOPY; VACUUM APPLICATIONS;

CATHODE EMITTERS;

CARBON NANOTUBES;

EID: 0037394715     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00018-2     Document Type: Conference Paper

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