Numerical modeling of gas-phase nucleation and particle growth during chemical vapor deposition of silicon

Journal of the Electrochemical Society

Volumn 147, Issue 6, 2000, Pages 2303-2311

  Girshick, S L ^a   Swihart, M T ^a,b   Suh, S M ^a   Mahajan, M R ^a   Nijhawan, S ^a  

^a University of Minnesota   (United States)

^b the State University of New York   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOLS; CHEMICAL VAPOR DEPOSITION; COAGULATION; COMPUTER SIMULATION; GASES; NUCLEATION; PARTICLES (PARTICULATE MATTER); PYROLYSIS; SILANES; THIN FILMS;

AEROSOL DYNAMIC MOMENT MODEL; PARTICLE GROWTH;

SEMICONDUCTING SILICON;

EID: 0034207031     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393525     Document Type: Article

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