Characteristics of platinum films etched with a SF6/Ar plasma

Journal of the Korean Physical Society

Volumn 42, Issue 2, 2003, Pages 196-199

  Kim, Sang Hoon ^a   Lee, Soon Woo ^a   Hwang, Jaehee ^a   Ahn, Jinho ^a  

^a Hanyang University   (South Korea)

Author keywords

ECR plasma; Etching; Plasma; Platinum electrode; Volatile compounds

Indexed keywords

EID: 0037295963     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (7)

1. D. E. Kotecki, Integr. Ferroelectr 16, 1 (1997).
2. J. M. Koo, I. Bang, T. H. Kim, J-G. Lee and J. Kim, J. Korean Phys. Soc. 38, 273 (2001).
3. Y. C. Choi and B. S. Lee, Mater. Chem. Phys. 61, 124 (1999).
4. J. S. Lee, J. H. Park, J. I. Yun, C. S. Kim and S. K. Joo, J. Korean Phys. Soc. 39, 184 (2001).
5. C. O. Jung, K. K. Choi, B. G. Hwang, J. T. Moon, M. Y. Lee and J. G. Lee, Thin Solid Films 341, 112 (1999).
6. M. Sugawara, Plasma etching: Fundamentals and Applications (Oxford Univ. Press, Oxford, 1998).
7. J. J. Wang, E. S. Lambers, S. J. Pearton, M. Ostling, C. M. Zetlerling, J. M. Grow, F. Ren and R. J. Shul, Solid-State Electronics 42, 2283 (1998).