A new liquid precursor with improved thermal stability for chemical vapor deposition of copper

Journal of the Electrochemical Society

Volumn 145, Issue 1, 1998, Pages 362-365

  Senzaki, Yoshihide ^a  

^a Sharp Microelectronics Technology Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CHARACTERIZATION; COPPER; ELECTRONS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; SEMICONDUCTING SILICON; SYNTHESIS (CHEMICAL); THERMODYNAMIC STABILITY;

COPPER FILM; LIQUID PRECURSOR;

THIN FILMS;

EID: 0031673809     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838261     Document Type: Article

References (11)

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