Pulse plating of Pt on n-GaAs ( 1 0 0 ) wafer surfaces: Synchrotron induced photoelectron spectroscopy and XPS of wet fabrication processes

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 200, Issue , 2003, Pages 432-438

  Ensling, D ^a   Hunger, R ^a   Kraft, D ^a   Mayer, Th ^a   Jaegermann, W ^a   Rodriguez Girones, M ^a   Ichizli, V ^a   Hartnagel, H L ^a  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Electrochemistry; GaAs; Photoelectron spectroscopy; Plating; Pt

Indexed keywords

ELECTROCHEMISTRY; ELECTROPLATING; PLATINUM; SURFACE TREATMENT; SYNCHROTRON RADIATION; VARACTORS; X RAY PHOTOELECTRON SPECTROSCOPY;

WET FABRICATION;

SEMICONDUCTING GALLIUM ARSENIDE;

EID: 0037247321     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)01735-4     Document Type: Conference Paper

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