XPS analysis of wet chemical etching of GaAs(110) by Br2-H2O: Comparison of emersion and model experiments

Electrochimica Acta

Volumn 45, Issue 28, 2000, Pages 4663-4672

  Beerbom, Martin ^a   Henrion, Oliver ^a   Klein, Andreas ^a   Mayer, Thomas ^a   Jaegermann, Wolfram ^a  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; BINARY MIXTURES; BROMINE; ETCHING; HYDROLYSIS; OXIDATION; PHASE INTERFACES; SURFACE STRUCTURE; SURFACE TREATMENT; WATER; X RAY PHOTOELECTRON SPECTROSCOPY;

SOLVATION EFFECTS; WET CHEMICAL ETCHING;

SEMICONDUCTING GALLIUM ARSENIDE;

EID: 0034291352     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(00)00618-6     Document Type: Article

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