Formation of size- and position-controlled nanometer size pt dots on gaas and inp substrates by pulsed electrochemical deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 4 B, 1999, Pages 2448-2452

  Sato, Taketomo ^a   Kaneshiro, Chinami ^a   Okada, Hiroshi ^a   Hasegawa, Hideki ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

Author keywords

AFM; Conductive probe; Electrochemical process; Electron beam lithography; GaAs; InP; Metal dot array; Pt; Schottky contact; SEM

Indexed keywords

EID: 0000697743     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.2448     Document Type: Article

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