Field emission properties of a-CNx films prepared by pulsed laser deposition

Applied Physics A: Materials Science and Processing

Volumn 76, Issue 1, 2003, Pages 15-19

  Fogarassy, E ^a   Szorenyi T ^a,b   Antoni, F ^a   Pirio, G ^c   Olivier, J ^c   Legagneux, P ^c   Boher, P ^d  

^a Faculté de Médecine   (France)

^b RESEARCH GROUP ON LASER PHYSICS   (Hungary)

^c THALES RESEARCH AND TECHNOLOGY   (France)

^d SOPRA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CARBON NITRIDE; EXCIMER LASERS; GRAPHITE; LASER ABLATION; LIGHT EMISSION; MORPHOLOGY; NITROGEN; PULSED LASER DEPOSITION; SILICON; SUBSTRATES; SURFACES;

AMORPHOUS CARBON NITRIDE; FIELD EMISSION PROPERTIES; GRAPHITE LIKE STRUCTURES;

THIN FILMS;

EID: 0037225098     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390201408     Document Type: Article

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