Uniformity and stability of field emission from bare and metal coated Si tip arrays

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 1 SPEC., 2003, Pages 427-432

  Gunther B ^a   Kaldasch, F ^a   Muller G ^a   Schmitt, S ^b   Henning, T ^b   Lacher, M ^b  

^a UNIVERSITY OF WUPPERTAL   (Germany)

^b INSTITUT FÜR MIKROTECHNIK MAINZ GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHROMIUM; CURRENT VOLTAGE CHARACTERISTICS; INDUCTIVELY COUPLED PLASMA; MAGNETRON SPUTTERING; OXYGEN; PHOTOLITHOGRAPHY; PLASMA ETCHING; PLATINUM; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; TUNGSTEN;

FIELD EMISSION SCANNING MICROSCOPE; FIELD EMISSION STABILITY; FIELD EMISSION UNIFORMITY; ISOTROPIC PLASMA ETCHING;

ELECTRON EMISSION;

EID: 0037207741     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1527642     Document Type: Article

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