Etch resistance enhancement and absorbance optimization with polyaromatic compounds for the design of 193 nm photoresists

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 355-358

  Argitis, P ^a   Vasilopoulou, M A ^a   Gogolides, E ^a   Tegou, E ^a   Hatzakis, M ^a   Kollia, Z ^b   Cefalas, A C ^b  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b Institute for Neohellenic Research   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; FILMS; LITHOGRAPHY; NANOTECHNOLOGY; PLASMA APPLICATIONS;

ETCH RESISTANCE ENHANCEMENT;

PHOTORESISTS;

EID: 0031655077     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00082-3     Document Type: Article

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