Enhancement of dry-etching durabilities by energy or etchant quenching with aliphatic, aromatic and alicyclic homopolymers, polymer blends and copolymers

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 7 B, 1999, Pages 4483-4487

  Kushida, Masahito ^a   Saito, Toshihiro ^a   Harada, Kieko ^a   Saito, Kyoichi ^a   Sugita, Kazuyuki ^a  

^a CHIBA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMS; CARBON; COPOLYMERS; ETCHING; MONOMERS; OXYGEN; PLASMA ETCHING; POLYMER BLENDS; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; SPUTTERING;

DRY ETCHING RATES; ETCHING DURABILITY; HOMOPOLYMERS; OHNISHI PLOT; POLYISOBORNYL ACRYLATE; POLYISOBORNYL METHACRYLATE; POLYMETHYL STYRENE; POLYVINYL NAPHTHALENE; RING PARAMETER; SPUTTER ETCHING;

DRY ETCHING;

EID: 0033157873     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.4483     Document Type: Article

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