The elimination of the 'artifact' in the electrostatic force measurement using a novel noncontact atomic force microscope/electrostatic force microscope

Applied Surface Science

Volumn 188, Issue 3-4, 2002, Pages 381-385

  Okamoto, Kenji ^a   Sugawara, Yasuhiro ^a   Morita, Seizo ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Atomic resolution; Electrostatic force measurement; FM detection; Kelvin probe force microscopy; Noncontact atomic force microscopy; Ultrahigh vacuum

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC FIELD EFFECTS; ELECTROSTATICS; SEMICONDUCTING SILICON; ULTRAHIGH VACUUM;

KELVIN PROBE FORCE MICROSCOPY (KPFM);

SURFACE PHENOMENA;

EID: 0037187253     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00953-9     Document Type: Conference Paper

References (8)