On the effects of implantation temperature in helium implanted silicon

Applied Physics Letters

Volumn 81, Issue 22, 2002, Pages 4201-4203

  Oliviero, E ^a   David, M L ^a   Beaufort, M F ^a   Barbot, Jean Francois ^a   Van Veen, A ^b  

^a UNIVERSITÉ DE POITIERS   (France)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DESORPTION; HELIUM; ION IMPLANTATION; POSITIVE IONS; SPECTROSCOPIC ANALYSIS; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

DESORPTION SPECTROSCOPY;

SEMICONDUCTING SILICON;

EID: 0037175799     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1525059     Document Type: Article

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