Porosity in porous methyl-silsesquioxane (MSQ) films

Applied Surface Science

Volumn 194, Issue 1-4, 2002, Pages 189-194

  Xu, Jun ^a   Moxom, Jeremy ^a   Yang, Shu ^b   Suzuki, R ^c   Ohdaira, T ^c  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Copolymers; Low k dielectrics; Methyl silsesquioxane; Porosity; Positron; Positronium

Indexed keywords

COPOLYMERS; DOPPLER EFFECT; GAMMA RAYS; PERMITTIVITY; PHOTONS; POROSITY; POSITRON ANNIHILATION SPECTROSCOPY; POSITRONS;

PORE GENERATORS; TRIBLOCK COPOLYMERS;

PLASTIC FILMS;

EID: 0037150977     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00122-8     Document Type: Conference Paper

References (12)