Current and potential uses of positron beams to study porosity in low-k dielectric thin films

Materials Science Forum

Volumn 363-365, Issue , 2001, Pages 15-19

  Rodbell, K P ^a   Petkov, M P ^b   Weber, M H ^b   Lynn, K G ^b   Volksen, W ^c   Miller, R D ^c  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b WASHINGTON STATE UNIVERSITY   (United States)

^c IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Low dielectric constant films; Porosity; Positron beams; Positronium (Ps) lifetime distribution

Indexed keywords

ANNEALING; COMPOSITION EFFECTS; COPPER; DIFFUSION; DOPPLER EFFECT; MAGNETIC FIELD EFFECTS; METALLIZING; PERMITTIVITY; PORE SIZE; POROSITY; POSITRON ANNIHILATION SPECTROSCOPY; THIN FILMS;

DIELECTRIC THIN FILMS; FILM POROSITY; MAGNETICALLY GUIDED BEAM; PERCOLATION THRESHOLD; POROGEN LOADING;

DIELECTRIC FILMS;

EID: 0035007243     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.363-365.15     Document Type: Conference Paper

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