Fiducial mark and nanocrack zone formation during thin-film delamination

Philosophical Magazine A: Physics of Condensed Matter, Structure, Defects and Mechanical Properties

Volumn 82, Issue 17-18, 2002, Pages 3383-3391

  Volinsky, Alex A ^a   Moody, Neville R ^b   Kottke, Michael L ^a   Gerberich, William W ^c  

^a MOTOROLA INC   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DELAMINATION; DISLOCATIONS (CRYSTALS); ELASTICITY; HYDROCARBONS; ION BEAMS; NANOSTRUCTURED MATERIALS; NUCLEATION; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY;

DISLOCATION SHIELDING MECHANISM;

THIN FILMS;

EID: 0037146405     PISSN: 01418610     EISSN: None     Source Type: Journal    
DOI: 10.1080/01418610208240449     Document Type: Article

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