Study of electron field emission and structural properties of nanostructured carbon thin films deposited by hot-filament-assisted reactive sputtering using methane gas

Vacuum

Volumn 66, Issue 3-4, 2002, Pages 239-243

  Lee, K Y ^a   Fujimoto, K ^a   Ohkura, S ^a   Honda, S ^a   Katayama, M ^a   Hirao, T ^a   Oura, K ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Carbon films; Field emission current density; Methane gas; RF magnetron sputtering

Indexed keywords

CARBON; CURRENT DENSITY; ELECTRIC FIELD EFFECTS; ELECTRON EMISSION; MAGNETRON SPUTTERING; METHANE; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

ELECTRON FIELD EMISSION;

THIN FILMS;

EID: 0037136083     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00148-3     Document Type: Article

References (11)