Characterization of the near-surface gas-phase chemical environment in atmospheric-pressure plasma chemical vapor deposition of diamond

Diamond and Related Materials

Volumn 8, Issue 10, 1999, Pages 1863-1874

  Larson, J M ^a   Swihart, M T ^a   Girshick, S L ^a  

^a University of Minnesota   (United States)

Author keywords

Chemical vapor deposition; Diamond; Radio frequency plasmas; Thermal plasmas

Indexed keywords

ACETYLENE; ATMOSPHERIC PRESSURE; BOUNDARY LAYERS; CARBON; CHEMICAL VAPOR DEPOSITION; ETHANE; HYDROGEN; MATHEMATICAL MODELS; METHANE; PLASMA APPLICATIONS;

GAS-PHASE CHEMISTRY; THERMAL PLASMAS;

DIAMOND FILMS;

EID: 0032685615     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00143-0     Document Type: Article

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