Deep UV mastering using an all-solid-state 266 nm laser for an over 20 GBytes/layer capacity disk

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 3 B, 1999, Pages 1837-1838

  Takeda, Minoru ^a   Furuki, Motohiro ^a   Yamatsu, Hisayuki ^a   Kashiwagi, Toshiyuki ^a   Aki, Yuichi ^a   Suzuki, Akitoshi ^a   Kondo, Kenji ^a   Oka, Michio ^a   Kubota, Shigeo ^a  

^a SONY CORPORATION   (Japan)

Author keywords

Chemically amplified resist; Deep UV; Mastering; Optical disk; Track pitch variation

Indexed keywords

CONTINUOUS WAVE LASERS; OPTICAL RECORDING; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SOLID STATE LASERS; ULTRAVIOLET RADIATION; LASER RECORDING; STORAGE ALLOCATION (COMPUTER);

CHEMICALLY AMPLIFIED RESISTS; DEEP ULTRAVIOLET MASTERING PROCESSES; DEEP ULTRAVIOLET MASTERING;

OPTICAL DISK STORAGE;

EID: 0032590332     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.1837     Document Type: Article

References (5)

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