New lithography technique using super-resolution near-field structure

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 535-538

  Kuwahara, M ^a   Nakano, T ^a   Tominaga, J ^a   Lee, M B ^a   Atoda, N ^a  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

LASER BEAMS; LIGHT SOURCES; MAGNETRON SPUTTERING; OPTICAL MULTILAYERS; OPTICAL RESOLVING POWER; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR LASERS;

CARRIER TO NOISE RATIO; CONSTANT LINEAR VELOCITY; FOCUSED LASER BEAM; PHOTORESIST FILM; SUPER RESOLUTION NEARFIELD STRUCTURE;

PHOTOLITHOGRAPHY;

EID: 0034207534     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00372-5     Document Type: Article

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