Micro- and nanopatterning of sensor chips by means of macroporous silicon

Sensors and Actuators, B: Chemical

Volumn 83, Issue 1-3, 2002, Pages 123-128

  Kurowski, A ^a   Schultze, J W ^a   Luth H ^b   Schoning M J ^b,c  

^a HEINRICH HEINE UNIVERSITY   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

^c AACHEN UNIVERSITY OF APPLIED SCIENCES   (Germany)

Author keywords

Microsystem technology; Porous silicon; Sensor

Indexed keywords

ELECTRODES; ETCHING; MICROPOROSITY; MICROSTRUCTURE; NANOTECHNOLOGY; POROUS SILICON;

MICROPATTERNING; NANOPATTERNING; SENSOR CHIPS;

SILICON SENSORS;

EID: 0037086237     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(01)01054-1     Document Type: Conference Paper

References (10)

1. The application of porous silicon interference filters in optical sensors
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4. Capacitive microsensors for biochemical sensing based on porous silicon technology
5. XPS investigations of electrochemically modified porous silicon layers
6. Deposition of nickel and cobalt by chemical reduction
7. The limits of macropore array fabrication
8. Properties of electroless and electroplated Ni-P and its application in microgalvanics
9. Electrochemical microsystem technologies: From fundamental research to technical systems