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Analytical Chemistry

Volumn 74, Issue 2, 2002, Pages 317-323

Surface modification and patterning using low-energy ion beams: Si-O bond formation at the vacuum/adsorbate interface

(6) Evans, Chris a Wade, Nathan a Pepi, Federico b Strossman, Greg c Schuerlein, Tom c Cooks, R Graham a

a PURDUE UNIVERSITY (United States)

b SAPIENZA UNIVERSITY OF ROME (Italy)

c CHARLES EVANS AND ASSOCIATES (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOND FORMATION;

ADSORBENTS; CHEMICAL BONDS; ETHERS; ION BEAMS; MASS SPECTROMETERS; MONOLAYERS; SULFUR COMPOUNDS; SURFACE TREATMENT; VACUUM; X RAY SPECTROSCOPY;

CHEMICAL ANALYSIS;

OXYGEN; SILICON;

ARTICLE; CHEMICAL BOND; CHEMICAL INTERACTION; CHEMICAL MODIFICATION; LOW ENERGY RADIATION; MASS SPECTROMETRY; SURFACE PROPERTY; VACUUM;

EID: 0037080307 PISSN: 00032700 EISSN: None Source Type: Journal
DOI: 10.1021/ac010928p Document Type: Article

Times cited : (37)

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