Additive lithography for fabrication of diffractive optics

Applied Optics

Volumn 41, Issue 29, 2002, Pages 6176-6181

  Pitchumani, Mahesh ^a   Hockel, Heidi ^a   Mohammed, Waleed ^a   Johnson, Eric G ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (OPTICAL); LIGHT TRANSMISSION; MASKS; MICROOPTICS; PHOTORESISTS;

MULTIPLE-EXPOSURE TECHNIQUES; PHOTOMASKS;

DIFFRACTIVE OPTICS;

EID: 0037057804     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.41.006176     Document Type: Article

References (11)

1. M. Kufner and S. Kufner, Micro-Optics and Lithography (Vub-press, Belgium, 1997).
2. A. Schilling, Ph. Nussbaum, I. Philipoussis, H. P. Herzig, L. Stauffer, M. Rossi, and E. B. Kley, “Micro-optical elements with arbitrary surfaces,” in Diffractive and Micro-Optics, OSA Technical Digest (Optical Society of America, Washington, D. C., 2000), pp. 234-236.
3. A. G. Poleshchuk, “Techniques for formation of the surface profile of diffractive optical elements,” in Optics and Lasers in Engineering (Elsevier Science, Amsterdam, 1998), Vol. 29, pp. 289 -306.
4. T. J. Suleski, B. Baggett, H. Miller, B. Delaney, and J. Pagan, “Wafer-scale replication of glass micro-optics for optical communications,” in Diffractive and Micro-Optics, OSA Technical Digest (Optical Society of America, Washington, D.C., 2000), pp. 231-233.
5. E. Pawlowski and H. Engel, “Multilevel diffractive optical elements fabricated with a single amplitude-phase mask,” Pure Appl. Opt. J Part A 6, 655-662 (1997).
6. A. V. Volkov, N. L. Kazanskiy, O. Ju. Moiseyev, and V. A. Soifer, “A method for the diffractive micro relief formation using the layered photo resist growth,” In Optics and Lasers in Engineering (Elsevier Science, Amsterdam, 1998), Vol. 29, pp. 281-288.
7. M. B. Stern, “Pattern transfer for diffractive and refractive microoptics,” in Microelectronic Engineering (Elsevier Science, Amsterdam, 1997), Vol. 34, pp. 299-319.
8. M. LeCompte, X. a. Gao, and D. W. Prather, “Photoresist characterization and linearization procedure for the gray-scale fabrication of diffractive optical elements,” Appl. Opt. 40, 5921-5927 (2001).
9. S. A. Ekhorutomwen and S. P. Sawan, “Critical review on photo resists,” in Polymers in Optics: Physics, Chemistry and Applications, R. A. Lessard and W. F. Frank, eds., Vol. CR63 of SPIE Critical Review Series (SPIE, Bellingham, Wash., 1996), pp. 214-238.
10. S Martellucci, and A. N. Chester, (eds.) Diffractive Optics and Optical Microsystems (Plenum, New York, 1997), pp. 23-33.
11. J. R. Shents and B. W. Smith, Microlithography, Science and Technology (Marcel Dekker, New York, 1998), pp. 109-152.