Multilevel diffractive optical elements fabricated with a single amplitude-phase mask

Pure and Applied Optics (Print edition) (United Kingdom)

Volumn 6, Issue 6, 1997, Pages 655-662

  Pawlowski, Edgar ^a   Engel, Herbert ^a  

^a FRAUNHOFER HEINRICH HERTZ INSTITUTE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; DRY ETCHING; INTEGRATED CIRCUIT MANUFACTURE; MASKS; PHOTOLITHOGRAPHY;

SINGLE AMPLITUDE PHASE MASKS;

INTEGRATED OPTOELECTRONICS;

EID: 0031277178     PISSN: 09639659     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-9659/6/6/007     Document Type: Article

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