Micro-optical elements with arbitrary surfaces

Optics InfoBase Conference Papers

Volumn , Issue , 2000, Pages 234-236

  Schilling, A ^a   Nussbaum, Ph ^a   Philipoussis, I ^a   Herzig, H P ^a   Stauffer, L ^b   Rossi, M ^c   Kley, E B ^d  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

^b Leica Geosystems AG   (Switzerland)

^c Centre Suisse d Electronique et Microtechnique   (Switzerland)

^d FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARBITRARY SURFACES; BINARY MASKS; DIRECT LASER WRITING; GRAY-TONE LITHOGRAPHY; MICROOPTICAL ELEMENTS; REACTIVE-ION ETCHING;

REACTIVE ION ETCHING;

EID: 0011107277     PISSN: None     EISSN: 21622701     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

1. M. T. Gale and M. Rossi, Diffractive Optics for Industrial and Commercial Applications, J. Turunen and F. Wyrowsky eds.; Ch.4 Continuousrelief diffractive lenses and microlens arrays, Akademie Verlag Berlin, 1997.
2. M. T. Gale, Th. Hessler, R. E. Kunz, H. Teichmann, Fabrication of continuous-relief micro-optics: progress in laser writing and replication technology, OSA Technical Digest Series, 5, 335 (1996).
3. M. B. Stern, Micro-Optics: Elements, Systems, and Applications, H. P. Herzig ed.; Ch. 3 Binary Optics Fabrication, Taylor & Francis (1997).
4. C. Wu, Method of making high energy beam sensitive glass, U. S. patent 5, 078, 771 (1992).
5. W. Daschner, C. Wu, S. H. Lee, General aspheric refractive micro-optics fabricated by optical lithography using a high energy beam sensitive glass gray-level mask, J. Vac. Sci. Technol. B, 14, 135-138 (1996).
6. Ch. Gimkiewicz, D. Hagedorn, J. Jahns, E.-B. Kley, F. Thoma, Fabrication of Mieroprisms for Planar Optical Interconnections by Use of Analog Gray-Scale Lithography with High-Energy-Beam-Sensitive Glass, Appl. Opt., 38, 2986-2990 (1999).