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Volumn 29, Issue 4-5, 1998, Pages 281-288
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A method for the diffractive microrelief formation using the layered photoresist growth
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ELECTROMAGNETIC WAVE DIFFRACTION;
MASKS;
PHOTORESISTS;
SEMICONDUCTOR DEVICE MANUFACTURE;
DIFFRACTIVE MICRORELIEF;
PHOTOMASKS;
OPTICAL DEVICES;
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EID: 0032045118
PISSN: 01438166
EISSN: None
Source Type: Journal
DOI: 10.1016/S0143-8166(97)00116-4 Document Type: Article |
Times cited : (78)
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References (10)
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