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Volumn 40, Issue 13, 2002, Pages 3093-3120

SISO run-to-run feedback controller using triple EWMA smoothing for semiconductor manufacturing processes

Author keywords

[No Author keywords available]

Indexed keywords

FEEDBACK CONTROL; MICROELECTRONIC PROCESSING; SELF TUNING CONTROL SYSTEMS; SEMICONDUCTOR DEVICE MANUFACTURE; STATISTICAL PROCESS CONTROL;

EID: 0037056111     PISSN: 00207543     EISSN: None     Source Type: Journal    
DOI: 10.1080/00207540210141652     Document Type: Article
Times cited : (38)

References (32)
  • 15
    • 0030394043 scopus 로고    scopus 로고
    • A multivariate self-tuning controller for run-to-run process control under shift and trend disturbances
    • (1996) IIE Transactions , vol.28 , pp. 1011-1021
    • Del Castillo, E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.