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Volumn 31, Issue 12, 1999, Pages 1157-1169

Long run and transient analysis of a double EWMA feedback controller

Author keywords

[No Author keywords available]

Indexed keywords

CLOSED LOOP CONTROL SYSTEMS; FEEDBACK CONTROL; MATHEMATICAL MODELS; OPTIMAL CONTROL SYSTEMS; PARAMETER ESTIMATION; PROBLEM SOLVING; PROCESS ENGINEERING; QUALITY CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE; SYSTEM STABILITY;

EID: 0033321365     PISSN: 0740817X     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1007648229991     Document Type: Article
Times cited : (81)

References (22)
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  • 2
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  • 3
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    • Roberts, S.W.1
  • 4
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    • Robinson, P.B. and Ho, T.Y. (1978) Average run lengths of geometric moving average charts by numerical methods. Technometrics, 20 (1), 85-93.
    • (1978) Technometrics , vol.20 , Issue.1 , pp. 85-93
    • Robinson, P.B.1    Ho, T.Y.2
  • 5
    • 0000638802 scopus 로고
    • Further contributions to adaptive quality control: Simultaneous estimation of dynamics: nonzero costs
    • Box, G.E.P. and Jenkins, G.M. (1963) Further contributions to adaptive quality control: simultaneous estimation of dynamics: nonzero costs. Bulletin of the International Statistical Institute, 34, 943-974.
    • (1963) Bulletin of the International Statistical Institute , vol.34 , pp. 943-974
    • Box, G.E.P.1    Jenkins, G.M.2
  • 6
    • 84893529721 scopus 로고
    • Statistical process monitoring and feedback adjustment-a discussion
    • Box, G.E.P. and Kramer, T. (1992) Statistical process monitoring and feedback adjustment-a discussion. Technometrics, 34,251-267.
    • (1992) Technometrics , pp. 251-267
    • Box, G.E.P.1    Kramer, T.2
  • 10
    • 0025387954 scopus 로고
    • Exponentially weighted moving average control schemes: Properties and enhancements
    • average schemes. Journal of Quality Technology, 21, 155-162. [10] Lucas, J.M. and Sacucci, M.S. (1990) Exponentially weighted moving average control schemes: properties and enhancements. Technometrics, 32, 1-12.
    • (1990) Technometrics , vol.32 , pp. 1-12
    • Lucas, I.1    Sacucci, M.S.2
  • 12
    • 0000407245 scopus 로고
    • Stability and sensitivity of an EWMA controller
    • Ingolfsson, A. and Sachs, E. (1993) Stability and sensitivity of an EWMA controller. Journal of Quality Technology, 25, 271-287.
    • (1993) Journal of Quality Technology , vol.25 , pp. 271-287
    • Ingolfsson, A.1    Sachs, E.2
  • 14
    • 0028425441 scopus 로고
    • Supervisory run-to-run control of a polysilicon gate etch using in situ Ellipsometry
    • Butler, S.W. and Stefani, J.A. (1994) Supervisory run-to-run control of a polysilicon gate etch using in situ Ellipsometry. IEEE Transactions on Semiconductor Manufacturing, 7, 193-201.
    • (1994) IEEE Transactions on Semiconductor Manufacturing , vol.7 , pp. 193-201
    • Butler, S.W.1    Stefani, J.A.2
  • 15
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    • Run to run process control: A review and some extensions
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  • 20
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    • A multivariate self-tuning controller for run-to-run process control under shift and trend disturbances
    • Del Castillo, E. (1996) A multivariate self-tuning controller for run-to-run process control under shift and trend disturbances. HE Transactions, 28 (12), 1011-1021.
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    • Del Castillo, E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.