Selective vapor deposition polymerization on actively patterned surfaces

Surface Science

Volumn 514, Issue 1-3, 2002, Pages 48-53

  Tsukagoshi, Kiyomi ^a,b   Mizutani, Wataru ^b   Tokumoto, Hiroshi ^b   Miyamae, Takayuki ^b   Nozoye, Hisakazu ^b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Alkanes; Aromatics; Atomic force microscopy; Insulating films; Self assembly; Silane; Silicon oxides; Surface chemical reaction

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; MONOMERS; PLASTIC FILMS; POLYMERIZATION; SELF ASSEMBLY; SURFACE REACTIONS; VAPOR DEPOSITION;

VAPOR DEPOSITION POLYMERIZATION;

SURFACE STRUCTURE;

EID: 0037055538     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(02)01606-0     Document Type: Conference Paper

References (18)