Effect of bias voltage on the formation of a-C:N nanostructures in ECR plasmas

Thin Solid Films

Volumn 420-421, Issue , 2002, Pages 212-218

  Liu, X W ^a   Chan, L H ^a   Hong, K H ^a   Shih, H C ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

a C:N nanofibers; Carbon nanotubes; ECR CVD; Transmission electron microscopy; X ray photoelectron spectroscopy

Indexed keywords

CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; ELECTRIC POTENTIAL; ELECTRON CYCLOTRON RESONANCE; PLASMA APPLICATIONS; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY;

NANOFIBERS;

NANOSTRUCTURED MATERIALS;

EID: 0037011178     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00798-8     Document Type: Conference Paper

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