Dependence of working gas pressure and ratio of Ar to O2 on properties of TiO2 films deposited by facing targets sputtering

Thin Solid Films

Volumn 420-421, Issue , 2002, Pages 433-437

  Takahashi, T ^a   Nakabayashi, H ^a  

^a UNIVERSITY OF TOYAMA   (Japan)

Author keywords

Facing targets sputtering; Transmittance spectrum; Working gas pressure

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; MORPHOLOGY; OXYGEN; PLASMA THEORY; SPECTROPHOTOMETERS; SPUTTER DEPOSITION; TITANIUM DIOXIDE; TRANSPARENCY; X RAY DIFFRACTION ANALYSIS;

FACING TARGETS SPUTTERING;

THIN FILMS;

EID: 0037011111     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00806-4     Document Type: Conference Paper

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