Oxygenation process of Ti-O films formed by reactive ion plating

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 5 A, 2001, Pages

  Oumi, K ^a   Kashiwagi, K ^a   Kokai, H ^a   Murayama, Y ^a  

^a TOYO UNIVERSITY   (Japan)

Author keywords

Crystal structure; OES; RF reactive ion plating; TEM; Titanium oxide

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; EMISSION SPECTROSCOPY; IONIZATION; PLATING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

REACTIVE ION PLATING;

THIN FILMS;

EID: 0035329072     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.l468     Document Type: Article

References (8)