-
1
-
-
0001926067
-
Transconductance in nitride-gate or oxynitride-gate transistors
-
Jan.
-
M. Khare, X. W. Wang, and T.P. Ma, "Transconductance in nitride-gate or oxynitride-gate transistors," IEEE Electron Device Lett., vol. 20, pp. 57-59, Jan. 1999.
-
(1999)
IEEE Electron Device Lett.
, vol.20
, pp. 57-59
-
-
Khare, M.1
Wang, X.W.2
Ma, T.P.3
-
2
-
-
0024933367
-
Reoxidized nitrided oxide for radiation-hardened MOS devices
-
Dec.
-
G.J. Dunn and P.W. Wyatt, "Reoxidized nitrided oxide for radiation-hardened MOS devices," IEEE Trans. Nucl. Sci., vol. 36, pp. 2161-2168, Dec. 1989.
-
(1989)
IEEE Trans. Nucl. Sci.
, vol.36
, pp. 2161-2168
-
-
Dunn, G.J.1
Wyatt, P.W.2
-
3
-
-
0030150046
-
Mobility behavior of n-channel and p-channel MOSFET's with oxynitride gate dielectrics formed by low-pressure rapid thermal chemical vapor deposition
-
May
-
E.M. Vogel, W.L. Hill, V. Misra, P.K. McLarty, J.J. Wortman, J.R. Hauser, P. Morfouli, G. Ghibaudo, and T. Ouisse, "Mobility behavior of n-channel and p-channel MOSFET's with oxynitride gate dielectrics formed by low-pressure rapid thermal chemical vapor deposition," IEEE Trans. Electron Devices, vol. 43, pp. 753-758, May 1996.
-
(1996)
IEEE Trans. Electron Devices
, vol.43
, pp. 753-758
-
-
Vogel, E.M.1
Hill, W.L.2
Misra, V.3
McLarty, P.K.4
Wortman, J.J.5
Hauser, J.R.6
Morfouli, P.7
Ghibaudo, G.8
Ouisse, T.9
-
5
-
-
0026222822
-
Radiation-induced neutral electron trap generation in electrically biased insulated gate field effect transistor gate insulators
-
Sept.
-
M. Walters and A. Reisman, "Radiation-induced neutral electron trap generation in electrically biased insulated gate field effect transistor gate insulators," J. Electrochem. Soc., vol. 138, pp. 2756-2762, Sept. 1991.
-
(1991)
J. Electrochem. Soc.
, vol.138
, pp. 2756-2762
-
-
Walters, M.1
Reisman, A.2
-
6
-
-
0022918802
-
Generation of interface states by ionizing radiation in very thin MOS oxides
-
Dec.
-
N.S. Saks, M.G. Ancona, and J.A. Modolo, "Generation of interface states by ionizing radiation in very thin MOS oxides," IEEE Trans. Nucl. Sci., vol. 23, pp. 1185-1190, Dec. 1986.
-
(1986)
IEEE Trans. Nucl. Sci.
, vol.33
, pp. 1185-1190
-
-
Saks, N.S.1
Ancona, M.G.2
Modolo, J.A.3
-
7
-
-
0032306849
-
Radiation induced leakage current and stress induced leakage current in ultra-thin gate oxides
-
Dec.
-
M. Ceschia, A. Paccagnella, A. Cester, A. Scarpa, and G. Ghidini, "Radiation induced leakage current and stress induced leakage current in ultra-thin gate oxides," IEEE Trans. Nucl. Sci., vol. 45, pp. 2375-2382, Dec. 1998.
-
(1998)
IEEE Trans. Nucl. Sci.
, vol.45
, pp. 2375-2382
-
-
Ceschia, M.1
Paccagnella, A.2
Cester, A.3
Scarpa, A.4
Ghidini, G.5
-
8
-
-
0034205654
-
Low field leakage current and soft breakdown in ultra-thin gate oxides after heavy ions, electrons or x-ray irradiation
-
June
-
M. Ceschia, A. Paccagnella, S. Sandrin, G. Chidini, J. Wyss, M. Lavale, and O. Flament, "Low field leakage current and soft breakdown in ultra-thin gate oxides after heavy ions, electrons or X-ray irradiation," IEEE Trans. Nucl. Sci. vol. 47, pp. 566-573, June 2000.
-
(2000)
IEEE Trans. Nucl. Sci.
, vol.47
, pp. 566-573
-
-
Ceschia, M.1
Paccagnella, A.2
Sandrin, S.3
Chidini, G.4
Wyss, J.5
Lavale, M.6
Flament, O.7
-
9
-
-
0034450447
-
Implications of radiation-induced dopant deactivation for npn bipolar junction transistors
-
Dec.
-
S.C. Witczak, R.C. Lacoe, M.R. Shaneyfelt, D.C. Mayer, J.R. Schwank, and P.S. Winokur, "Implications of radiation-induced dopant deactivation for npn bipolar junction transistors," IEEE Trans. Nucl. Sci., vol. 47, pp. 2281-2288, Dec. 2000.
-
(2000)
IEEE Trans. Nucl. Sci.
, vol.47
, pp. 2281-2288
-
-
Witczak, S.C.1
Lacoe, R.C.2
Shaneyfelt, M.R.3
Mayer, D.C.4
Schwank, J.R.5
Winokur, P.S.6
-
10
-
-
0000415836
-
Charge separation technique for metal-oxide-silicon capacitors in the presence of hydrogen deactivated dopants
-
June
-
S.C. Witczak, P.S. Winokur, R.C. Lacoe, and D.C. Mayer, "Charge separation technique for metal-oxide-silicon capacitors in the presence of hydrogen deactivated dopants," J. Appl. Phys., vol. 87, pp. 8206-8208, June 2000.
-
(2000)
J. Appl. Phys.
, vol.87
, pp. 8206-8208
-
-
Witczak, S.C.1
Winokur, P.S.2
Lacoe, R.C.3
Mayer, D.C.4
-
11
-
-
4243404261
-
The effect of substrate radiation-induced defects on the operation of deep submicron technologies
-
in the Proc. of DECON 2001, Eds B.O. Kolbesen, C. Claeys, P. Stallhofer, and F. Tardif
-
E. Simoen, A. Poyai, and C. Claeys, "The effect of substrate radiation-induced defects on the operation of deep submicron technologies," in the Proc. of DECON 2001, Eds B.O. Kolbesen, C. Claeys, P. Stallhofer, and F. Tardif, The Electrochem. Soc. Proc. vol. 2001-19, pp. 75-92, 2001.
-
(2001)
The Electrochem. Soc. Proc.
, vol.2001-2019
, pp. 75-92
-
-
Simoen, E.1
Poyai, A.2
Claeys, C.3
-
12
-
-
0013321079
-
-
K. Hayama, H. Ohyama, K. Kobayashi, A. Poyai, E. Simeon, C. Claeys, Y. Takami, H. Takizawa, and A. Mohammadzadeh, in the Proc. of the RADECS 2000 Workshop, Louvain-la-Neuve, Belgium, 11-13 September, 2000, pp. 32-35.
-
Proc. of the RADECS 2000 Workshop, Louvain-la-Neuve, Belgium, 11-13 September, 2000
, pp. 32-35
-
-
Hayama, K.1
Ohyama, H.2
Kobayashi, K.3
Poyai, A.4
Simeon, E.5
Claeys, C.6
Takami, Y.7
Takizawa, H.8
Mohammadzadeh, A.9
-
13
-
-
4243706675
-
Proton-irradiation effect on the electric-field enhancement of the generation lifetime in shallow p-n junction diodes
-
in the Proc. of DECON 2001, Eds B.O. Kolbesen, C. Claeys, P. Stallhofer, and F. Tardif
-
A. Poyai, E. Simeon, C. Claeys, K. Hayama, K. Kobayashi, and H. Ohyama, "Proton-irradiation effect on the electric-field enhancement of the generation lifetime in shallow p-n junction diodes," in the Proc. of DECON 2001, Eds B.O. Kolbesen, C. Claeys, P. Stallhofer, and F. Tardif, The Electrochem. Soc. Proc. vol. 2001-19, pp. 93-102, 2001.
-
(2001)
The Electrochem. Soc. Proc.
, vol.2001-2019
, pp. 93-102
-
-
Poyai, A.1
Simoen, E.2
Claeys, C.3
Hayama, K.4
Kobayashi, K.5
Ohyama, H.6
-
14
-
-
0035575912
-
Impact of gate oxide nitridation process on 1/f noise in 0.18 μm CMOS
-
Dec.
-
M. Da Rold, E. Simeon, S. Mertens, M. Schaeker, G. Badenes, and S. Decoutere, "Impact of gate oxide nitridation process on 1/f noise in 0.18 μm CMOS," Microelectron Reliab., vol. 41, pp. 1933-1938, Dec. 2001.
-
(2001)
Microelectron Reliab.
, vol.41
, pp. 1933-1938
-
-
Da Rold, M.1
Simeon, E.2
Mertens, S.3
Schaeker, M.4
Badenes, G.5
Decoutere, S.6
-
15
-
-
0345133598
-
Evidence for short-channel effect in the radiation response of 0.18 μm CMOS transistors
-
E. Simeon, J. Hermans, E. Augendre, T. Marescaux, C. Claeys, G. Badenes, and A. Mohammadzadeh, "Evidence for short-channel effect in the radiation response of 0.18 μm CMOS transistors," in the Proc. of the RADECS 2000 Workshop, Louvain-la-Neuve, Belgium, 11-13 September, 2000, pp. 25-31.
-
Proc. of the RADECS 2000 Workshop, Louvain-la-Neuve, Belgium, 11-13 September, 2000
, pp. 25-31
-
-
Simoen, E.1
Hermans, J.2
Augendre, E.3
Marescaux, T.4
Claeys, C.5
Badenes, G.6
Mohammadzadeh, A.7
-
16
-
-
0026869985
-
A new "shift and ratio" method for MOSFET channel-length extraction
-
May
-
Y. Taur, D.S. Zicherman, D.R. Lombardi, P.J. Restle, C.H. Hsu, H.I. Hanafi, M.R. Wordeman, B. Davari, G.G. Shahidi, "A new "shift and ratio" method for MOSFET channel-length extraction," IEEE Electron Device Lett., vol. 13, pp. 267-269, May 1992.
-
(1992)
IEEE Electron Device Lett.
, vol.13
, pp. 267-269
-
-
Taur, Y.1
Zicherman, D.S.2
Lombardi, D.R.3
Restle, P.J.4
Hsu, C.H.5
Hanafi, H.I.6
Wordeman, M.R.7
Davari, B.8
Shahidi, G.G.9
-
17
-
-
0033314604
-
Overcoming scaling concerns in a radiation-hardened CMOS technology
-
Dec.
-
J. Maimon and N. Haddad, "Overcoming scaling concerns in a radiation-hardened CMOS technology," IEEE Trans. Nucl. Sci., vol. 46, pp. 1686-1689, Dec. 1999.
-
(1999)
IEEE Trans. Nucl. Sci.
, vol.46
, pp. 1686-1689
-
-
Maimon, J.1
Haddad, N.2
-
19
-
-
0026853304
-
Effects of X-ray irradiation on GIDL in MOSFETs
-
April
-
A. Acovic, C.C.-H. Hsu, L.-C. Hsia, A. Balasinki, and T.-P. Ma, "Effects of X-ray irradiation on GIDL in MOSFETs," IEEE Electron Device Lett., vol. 13, pp. 189-191, April 1992.
-
(1992)
IEEE Electron Device Lett.
, vol.13
, pp. 189-191
-
-
Acovic, A.1
Hsu, C.C.-H.2
Hsia, L.-C.3
Balasinki, A.4
Ma, T.-P.5
-
20
-
-
0013225785
-
-
"Radiation effects on gate induced drain leakage current in metal oxide semiconductor transistors,"; Nov.
-
N.C. Das, V. Nathan, R. Tallon, and R.J. Maier, "Radiation effects on gate induced drain leakage current in metal oxide semiconductor transistors," J. Appl. Phys., vol. 72, pp. 4958-4962, Nov. 1992.
-
(1992)
J. Appl. Phys.
, vol.72
, pp. 4958-4962
-
-
Das, N.C.1
Nathan, V.2
Tallon, R.3
Maier, R.J.4
-
21
-
-
0022059443
-
Flat-band voltage dependence on channel length in short-channel threshold model
-
May
-
J.S.T. Huang and J.W. Schrankler, "Flat-band voltage dependence on channel length in short-channel threshold model," IEEE Trans. Electron Devices, vol. 32, pp. 1001-1002, May 1985.
-
(1985)
IEEE Trans. Electron Devices
, vol.32
, pp. 1001-1002
-
-
Huang, J.S.T.1
Schrankler, J.W.2
-
22
-
-
0000276295
-
Gate size dependence of the radiation-produced changes in threshold voltage, mobility, and interface state density in bulk CMOS
-
Dec.
-
J. Scarpulla, A.L. Amran, V.W. Gin, T.C. Morse, and K.T. Nakamura, "Gate size dependence of the radiation-produced changes in threshold voltage, mobility, and interface state density in bulk CMOS," IEEE Trans. Nucl. Sci., vol. 39, pp. 1990-1997, Dec. 1992.
-
(1992)
IEEE Trans. Nucl. Sci.
, vol.39
, pp. 1990-1997
-
-
Scarpulla, J.1
Amran, A.L.2
Gin, V.W.3
Morse, T.C.4
Nakamura, K.T.5
-
23
-
-
0027851451
-
Effects of device scaling and geometry on MOS radiation hardness assurance
-
Dec.
-
M.R. Shaneyfelt, D.M. Fleetwood, P.S. Winokur, J.R. Schwank, and T.L. Meisenheimer, "Effects of device scaling and geometry on MOS radiation hardness assurance," IEEE Trans. Nucl. Sci., vol. 40, pp. 1678-1685, Dec. 1993.
-
(1993)
IEEE Trans. Nucl. Sci.
, vol.40
, pp. 1678-1685
-
-
Shaneyfelt, M.R.1
Fleetwood, D.M.2
Winokur, P.S.3
Schwank, J.R.4
Meisenheimer, T.L.5
-
24
-
-
0028393343
-
A two-dimensional numerical simulation of oxide charge buildup in MOS transistors due to radiation
-
March
-
V. Vasudevan and J. Vasi, "A two-dimensional numerical simulation of oxide charge buildup in MOS transistors due to radiation," IEEE Trans. Electron Devices, vol. 41, pp. 383-390, March 1994.
-
(1994)
IEEE Trans. Electron Devices
, vol.41
, pp. 383-390
-
-
Vasudevan, V.1
Vasi, J.2
-
25
-
-
0026403231
-
Lateral distribution of radiation-induced damage in MOSFETs
-
Dec.
-
W. Chen, A. Balasinki, and T.-P. Ma, "Lateral distribution of radiation-induced damage in MOSFETs," IEEE Trans. Nucl. Sci., vol. 38, pp. 1124-1129, Dec. 1991.
-
(1991)
IEEE Trans. Nucl. Sci.
, vol.38
, pp. 1124-1129
-
-
Chen, W.1
Balasinki, A.2
Ma, T.-P.3
-
26
-
-
84861245788
-
Ionizing radiation damage near CMOS transistor channel edges
-
Dec.
-
A. Balasinki and T.-P. Ma, "Ionizing radiation damage near CMOS transistor channel edges," IEEE Trans. Nucl. Sci., vol. 39, pp. 1998-2003, Dec. 1992.
-
(1992)
IEEE Trans. Nucl. Sci.
, vol.39
, pp. 1998-2003
-
-
Balasinki, A.1
Ma, T.-P.2
-
27
-
-
0027831993
-
Impact of radiation-induced nonuniform damage near MOSFET junctions
-
Dec.
-
A. Balasinki and T.-P. Ma, "Impact of radiation-induced nonuniform damage near MOSFET junctions," IEEE Trans. Nucl. Sci., vol. 40, pp. 1286-1292, Dec. 1993.
-
(1993)
IEEE Trans. Nucl. Sci.
, vol.40
, pp. 1286-1292
-
-
Balasinki, A.1
Ma, T.-P.2
-
28
-
-
0022600166
-
Simple technique for separating the effects of interface traps and trapped-oxide charge in metal-oxide-semiconductor transistors
-
Jan.
-
P.J. McWhorter and P.S. Winokur, "Simple technique for separating the effects of interface traps and trapped-oxide charge in metal-oxide-semiconductor transistors," Appl. Phys. Lett., vol. 48, pp. 133-135, Jan. 1986.
-
(1986)
Appl. Phys. Lett.
, vol.48
, pp. 133-135
-
-
McWhorter, P.J.1
Winokur, P.S.2
|